Directed by Erdem Alaca this facility serves micro and nanofabrication needs of faculty and students from various departments as well as external users. Certified as Class 1000 in 2006 the laboratory has provided uninterrupted services since then.

The following patterning (10 nm CD), metallization, wet and dry etching capabilities exist within the laboratory:

01- mask aligner (Karl Süss-MA45),
02- photoresist spinners (SPS),
03- surface profiler (Dektak 8),
04- RF magnetron sputter tool with two magnetrons (Vaksis PVD-Handy/2S),
05- wafer scriber (OEG MR200),
06- reactive ion etcher (Plasmatherm Vision 320 Mk II),
07- electrochemical deposition setups,
08- inspection microscope,
09- wet benches, laminar flow hoods and deionized water system (Köttermann-Sartorius),
10- Scanning Probe Lithography Tool (nano analytik GmbH).


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